| Autor: |
Takashima, Seigou, Hori, Masaru, Goto, Toshio, Kono, Akihiro, Ito, Masafumi, Yoneda, Katsumi |
| Předmět: |
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| Zdroj: |
Applied Physics Letters; 12/20/1999, Vol. 75 Issue 25, p3929, 3p, 2 Diagrams, 3 Graphs |
| Abstrakt: |
Develops a measurement technique for absolute H-atom densities in process plasmas using vacuum ultraviolet absorption spectroscopy. Employment of a high-pressure microdischarge hollow-cathode lamp (MHCL) as a Lyman alpha emission light source; Effect of self-absorption in the MHCL; Contribution of the collisional broadening to the Lyman alpha emission profile. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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