| Autor: |
Alam, M.A., People, R., Isaacs, E., Kim, C.Y., Evans-Lutterodt, K., Siegrist, T., Pernell, T.L., Vandenberg, J., Sputz, S.K., Chu, S.N.G., Lang, D.V., Smith, L., Hybertsen, M.S. |
| Předmět: |
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| Zdroj: |
Applied Physics Letters; 5/3/1999, Vol. 74 Issue 18, p2617, 3p, 11 Graphs |
| Abstrakt: |
Interprets the metalorganic chemical vapor deposition technique called selective area growth (SAG) using a three-dimensional vapor phase model. Profiles of thickness predicted by the model; Long range effects of the thickness composition of metals; Uses of the SAG process; Key idea behind SAG. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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