Preservation of atomically clean silicon surfaces in air by contact bonding.

Autor: Grey, Francois, Hermansson, Karin
Předmět:
Zdroj: Applied Physics Letters; 12/8/1997, Vol. 71 Issue 23, p3400, 3p, 4 Black and White Photographs
Abstrakt: Demonstrates the preservation of atomic-scale structure of silicon surfaces by contact bonding. Provision of ultra-high vacuum conditions by bond cleavage; Protection of ordered atomic structure of the surfaces from oxidation; Reduction of surface contamination by contact bonded silicon wafers.
Databáze: Complementary Index