Confirmation of proton beam bending in graded Si[sub 1-x]Ge[sub x]/Si layers using ion channeling.

Autor: de Kerckhove, D.G., Breese, M.B.H.
Předmět:
Zdroj: Applied Physics Letters; 1/11/1999, Vol. 74 Issue 2, p227, 3p, 7 Graphs
Abstrakt: Studies a graded composition Si[sub 1-x]Ge[sub x]/Si [001] layer by angle-resolved ion channeling analysis using focused MeV proton and He[sup +] beams. Backscattering spectrometry's confirmation that the composition is linearly graded.
Databáze: Complementary Index