Improvement of ultrathin gate oxide and oxynitride integrity using fluorine implantation technique.
| Autor: | Chowdhury, Prasenjit, Chou, Anthony I. |
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| Zdroj: | Applied Physics Letters; 1/6/1997, Vol. 70 Issue 1, p37, 3p |
| Abstrakt: | Investigates the effects of fluorine on ultrathin gate oxide and oxynitride. Incorporation of fluorine into polycrystalline silicon; Improvement of the integrity of the oxide with the incorporation of fluorine; Discussion of the mechanism for oxide quality improvement by fluorine. |
| Databáze: | Complementary Index |
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