The energetics of {113} stacking fault formation in Si from supersaturated interstitials.

Autor: Cuendet, Nicolas, Halicioglu, Timur
Předmět:
Zdroj: Applied Physics Letters; 1/1/1996, Vol. 68 Issue 1, p19, 3p, 1 Diagram, 4 Graphs
Abstrakt: Calculates the microvoid formation free energies of {113} stacking faults in silicon. Types of stacking faults; Reduction of the free energy of formation per interstitial in a ribbon fault with the ribbon width and length; Use of the modified Tersoff potential energy function; Association of transient enhanced diffusion with implantation-produced {113}-type ribbon.
Databáze: Complementary Index