Diamond deposition from fluorinated precursors using microwave-plasma chemical vapor deposition.
| Autor: | Fox, Ciaran A., McMaster, Mark C. |
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| Zdroj: | Applied Physics Letters; 10/16/1995, Vol. 67 Issue 16, p2379, 3p, 3 Graphs |
| Abstrakt: | Presents a method of growing diamond thin films using fluorinated precursors. Utilization of microwave plasma-assisted chemical vapor deposition in the process; Values of the growth activation energies; Indication of negligible fluorine incorporation into the film. |
| Databáze: | Complementary Index |
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