Average energy deposited per atom: A universal parameter for describing ion-assisted film growth?
| Autor: | Petrov, I., Adibi, F. |
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| Zdroj: | Applied Physics Letters; 7/5/1993, Vol. 63 Issue 1, p36, 3p, 5 Graphs |
| Abstrakt: | Examines the average energy deposited per atom to describe the effects of low-energy ion irradiation on film microstructure. Characteristics of film microstructure with Ji/JMe; Effects of an increase in Ji/JMe on intracolumn porosity; Influence of ion irradiation on microstructure alteration. |
| Databáze: | Complementary Index |
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