Autor: |
Rezaei, M.A., Stipe, B.C. |
Předmět: |
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Zdroj: |
Journal of Chemical Physics; 10/8/1998, Vol. 109 Issue 14, p6075, 4p, 12 Black and White Photographs, 2 Graphs |
Abstrakt: |
Investigates the induction and imaging molecule dissociation on a semiconductor surface. Use of variable-temperature, ultrahigh vacuum scanning tunneling microscope; Effect of sulfidation on the materials properties of alloys; Calculation of the activation barrier from the atomistic analysis of the dissociation rates. |
Databáze: |
Complementary Index |
Externí odkaz: |
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