Strong anisotropy in thin magnetic films deposited on obliquely sputtered Ta underlayers.

Autor: McMichael, R. D., Lee, C. G., Bonevich, J. E., Chen, P. J., Miller, W., Egelhoff Jr., W. F.
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Zdroj: Journal of Applied Physics; 11/1/2000, Vol. 88 Issue 9, p5296, 4p, 1 Black and White Photograph, 1 Diagram, 1 Chart, 2 Graphs
Abstrakt: Reports on strong anisotropy in thin magnetic films deposited on obliquely sputtered tantalum underlayers. Fitting the angular dependence of the ferromagnetic resonance field to obtain values of anisotropy field; Microstructure of spin valve; Magnetoresistive measurements of the dispersion of the hard axis directions.
Databáze: Complementary Index