| Autor: |
Okkerse, M., Kleijn[a], C.R., van den Akker, H.E.A., de Croon, M.H.J.M., Marin, G.B. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 10/1/2000, Vol. 88 Issue 7, p4417, 12p, 2 Charts, 16 Graphs |
| Abstrakt: |
Presents a two-dimensional model for the hydrodynamics and chemistry of an oxy-acetylene torch reactor for chemical vapor deposition of diamond. Features of the model; Boundary conditions; Discretization and numerical method; Solution strategy; Validation of the model; Regime characterization. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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