| Autor: |
Ryan, E. Todd, Gates, Stephen M., Grill, Alfred, Molis, Steven, Flaitz, Philip, Arnold, John, Sankarapandian, Muthumanickam, Cohen, Stephan A., Ostrovski, Yuri, Dimitrakopoulos, Christos |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; Nov2008, Vol. 104 Issue 9, p094109, 7p, 1 Diagram, 3 Charts, 11 Graphs |
| Abstrakt: |
The resistance to plasma-induced damage of various nanoporous, ultra low-κ porous SiCOH films used as interconnect dielectric materials in integrated circuits was studied. These films are susceptible to damage by plasma processes used during nanofabrication. The dielectric constants and chemical compositions of four dielectric films were correlated with measured amounts of plasma damage. Films deposited with higher carbon content in the form of Si–CH3 and Si(CH3)2 bonding exhibited less plasma damage than similar films with lower carbon content. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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