| Autor: |
Haneveld, Jeroen, Tas, Niels R., Brunets, Nataliya, Jansen, Henri V., Elwenspoek, Miko |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; Jul2008, Vol. 104 Issue 1, p014309, 6p, 1 Color Photograph, 1 Diagram, 1 Chart, 3 Graphs |
| Abstrakt: |
We have developed a procedure for accurate fabrication of silicon-based nanochannels down to a few nanometer channel height, based on the use of a thin thermal silicon oxide spacer layer. Nanochannels with a predictable and carefully measured height between 5 and 50 nm were successfully fabricated and filled with de-ionized water. For all channel heights the filling kinetics behaves according to the classical Washburn law for capillary filling, with a small correction for a loss of liquid at the moving front at a constant rate and a smaller than expected Washburn coefficient (up to a factor of 1.6 smaller for water in 5 nm channels). [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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