| Autor: |
A. Danilov, R. Nazmutdinov, T. Zinkicheva, E. Molodkina, A. Rudnev, Yu. Polukarov, J. Feliu |
| Předmět: |
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| Zdroj: |
Russian Journal of Electrochemistry; Jun2008, Vol. 44 Issue 6, p697-708, 12p |
| Abstrakt: |
Abstract Mechanism of copper underpotential deposition at stepped faces of platinum single crystals Pt(hkl) is studied using cyclic voltammetry, scanning probe microscopy, and quantum-chemical modelling. It is shown that the first stage of UPD is one-dimensional decoration of the (100)- or (110)-orientated steps, then copper monolayer forms at (111)-terraces. The final stage is the secondary step decoration. Quantum-chemical modelling, with the using of long-distance potentials of the Cu-Pt and Cu-Cu pair interactions, allows estimating the energy of copper adsorption at different structure elements of the substrate (steps, kinks, terraces) and revealing the succession of the adatom monolayer formation; it also provides additional information for the identifying of the nature of voltametric peaks for different stages of the copper adsorption-desorption. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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