Electrical characteristics of thin Ta...O... films deposited by reactive pulsed direct-current...
| Autor: | Kim, J.-Y., Nielsen, M. C. |
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| Zdroj: | Journal of Applied Physics; 2/1/2000, Vol. 87 Issue 3, p1448, 5p, 2 Charts, 6 Graphs |
| Abstrakt: | Presents a study which used pulsed magnetron sputtering technique for the production of tantalum oxide films having a high dielectric constant and low leakage current density at low substrate temperature. Experimental details; Results and discussion; Conclusions. |
| Databáze: | Complementary Index |
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