| Autor: |
Gordon, R. A., Crozier, E. D., Jiang, D.-T., Shoults, J., Barg, B., Budnik, P. S. |
| Předmět: |
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| Zdroj: |
AIP Conference Proceedings; 2007, Vol. 882 Issue 1, p887-889, 3p, 1 Diagram, 1 Graph |
| Abstrakt: |
An end-station for in-situ characterization of thin films at the PNC/XOR undulator beamline, Sector 20 of the Advanced Photon Source, is detailed. The ability to study films in-situ on a beamline enables examination of surfaces and interfaces on freshly-prepared films, without the influence of a capping layer. The MBE1 molecular beam epitaxy system was designed with this in mind. Now in routine operation and available for General Users on a collaborative basis, the primary function of MBE1 is to undertake polarization-dependent XAFS studies on fresh or stored films, but it also has the capability to do X-ray Standing Wave and Reflectivity measurements. The characteristics of the MBE1 system — its ranges of motions and detector options — are described in detail, with example data illustrating its functionality. © 2007 American Institute of Physics [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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