Autor: |
Khalili, Mahideh S., Ghafuri, Hossein, Mojahedi-Jahromi, Samaneh, Hashemi, Mohammed M. |
Předmět: |
|
Zdroj: |
Phosphorus, Sulfur & Silicon & the Related Elements; Jan2007, Vol. 182 Issue 1, p175-179, 5p, 2 Diagrams, 1 Chart |
Abstrakt: |
A simple and mild procedure for the trimethylsilylation of a wide variety of phenols with hexamethyldisilazane (HMDS) on the surface of silica gel dispersed with NaHSO4 at r.t. in a few minutes with excellent yields under neutral conditions is reported. This procedure also allows an excellent selectivity for the silylation of phenols in the presence of amine and CO2H groups. [ABSTRACT FROM AUTHOR] |
Databáze: |
Complementary Index |
Externí odkaz: |
|