Simple and Practical Protocol for the Silylation of Phenol Derivatives Using Reusable NaHSO4 Dispread on Silica Gel Under Neutral Conditions.

Autor: Khalili, Mahideh S., Ghafuri, Hossein, Mojahedi-Jahromi, Samaneh, Hashemi, Mohammed M.
Předmět:
Zdroj: Phosphorus, Sulfur & Silicon & the Related Elements; Jan2007, Vol. 182 Issue 1, p175-179, 5p, 2 Diagrams, 1 Chart
Abstrakt: A simple and mild procedure for the trimethylsilylation of a wide variety of phenols with hexamethyldisilazane (HMDS) on the surface of silica gel dispersed with NaHSO4 at r.t. in a few minutes with excellent yields under neutral conditions is reported. This procedure also allows an excellent selectivity for the silylation of phenols in the presence of amine and CO2H groups. [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index