| Autor: |
Endo, Kazuhiko, Shinoda, Keisuke |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 9/1/1999, Vol. 86 Issue 5, p2739, 7p, 1 Diagram, 8 Graphs |
| Abstrakt: |
Presents a study which conducted helicon-wave plasma enhanced chemical vapor deposition on fluorinated amorphous carbon thin films for use as low-dielectric-constant interlayer dieletrics. Adjustment of the fluorine-to-carbon ratio of the deposited film; Experimental procedure; Results and discussion; Summary. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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