| Autor: |
Aoi, Yoshifumi, Ono, Kojiro |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 8/15/1999, Vol. 86 Issue 4, p2318, 5p, 1 Chart, 7 Graphs |
| Abstrakt: |
Presents information on a study which investigated the effects of nitrogen pressure in the pulsed laser deposition chamber and radio frequency input power during the operation of the radical beam source on carbon nitride thin film characteristics. Methodology of the study; Results and discussion on the study; Conclusions. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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