The effect of as-implanted damage on the microstructure of threading dislocations in MeV...

Autor: Bourdelle, K. K., Eaglesham, D. J.
Předmět:
Zdroj: Journal of Applied Physics; 8/1/1999, Vol. 86 Issue 3, p1221, 5p, 3 Black and White Photographs, 4 Graphs
Abstrakt: Presents information on a study which measured the dose dependence of as-implanted damage and the density of threading dislocations formed after MeV implants in silicon. Experimental details; Results and discussion.
Databáze: Complementary Index