| Autor: |
Hong-Xiang Wei, Langford, R M., Xiufeng Han, Coey, J. M. D. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 4/15/2006, Vol. 99 Issue 8, p08C501, 3p, 1 Black and White Photograph, 1 Chart, 1 Graph |
| Abstrakt: |
A method for the controlled fabrication of a nickel perpendicular nanocontact with diameters less than 5 nm is reported. The method involves milling pores through the 100 nm thick silicon nitride membrane using a focused ion beam, and depositing thin Ni film on the both side of the silicon nitride membrane. The shape of the resulting pore and nanocontact size is determined by the initial hole size and redeposition of the sputtered material onto the sidewalls of the holes. A sub-5 nm Ni nanocontact was prepared and the I-V and R-H characteristics measured. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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