An MOCVD Approach to High-k Praseodymium-Based Films.
| Autor: | R. Lo Nigro, G. Malandrino, R. G. Toro, I. L. Fragalà |
|---|---|
| Zdroj: | Chemical Vapor Deposition; Mar2006, Vol. 12 Issue 2/3, p109-124, 16p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | R. Lo Nigro, G. Malandrino, R. G. Toro, I. L. Fragalà |
|---|---|
| Zdroj: | Chemical Vapor Deposition; Mar2006, Vol. 12 Issue 2/3, p109-124, 16p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|
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