| Autor: |
Qiu, J. J., Han, G. C., Li, K. B., Liu, Z. Y., Zong, B. Y., Wu, Y. H. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 5/1/2006, Vol. 99 Issue 9, p094304, 4p, 1 Black and White Photograph, 4 Charts, 3 Graphs |
| Abstrakt: |
The magnetostriction coefficient (λs) of ultrathin sputtered polycrystalline as-deposited and annealed Ta/Ni81Fe19(t)/Ta films was studied as a function of the thickness. λs and magnetoresistance (MR) of bottom-type spin valves (SVs) with nano-oxide layer (NOL) added in the pinned layer were investigated by using NiFe, Co90Fe10, and CoFe/NiFe/CoFe layers as free layer (FL), respectively. λs of SV with NOL increased slightly except that of CoFe FL. NOLs were added at different positions to study the effects of NOL on λs of CoFe FL. All λs of CoFe FL change from negative to positive and its absolute value also increases significantly with CoFeOx related NOL added below. Our λs and surface roughness results indicated that the structure of the film not the roughness dominates λs of ultrathin FL in SVs. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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