Initiated CVD of Poly(methyl methacrylate) Thin FilmsThe authors acknowledge the support of the NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing. This work made use of MRSEC Shared Facilities supported by the National Science Foundation under Grant DMR-9400334.

Autor: K. Chan, K. K. Gleason
Zdroj: Chemical Vapor Deposition; Oct2005, Vol. 11 Issue 10, p437-443, 0p
Databáze: Complementary Index
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