Photoresist Modification of Sol–Gel Solutions for Texturing of Bi4Ti3O12 and Bi3TiNbO9 Thin Films.

Autor: Lee J. Benysek, Paul A. Fuierer
Zdroj: Journal of Sol-Gel Science & Technology; Jun2005, Vol. 34 Issue 3, p241-250, 10p
Abstrakt: Abstract Bismuth titanate (Bi4Ti3O12) and bismuth titanium niobate (Bi3TiNbO9) c-axis textured thin films were fabricated using the sol–gel processing technique. Chemical modification of precursor solutions was performed using a proprietary photosensitive chemical (photoresist). Increases in crystallinity and texture of resulting films were seen over films that were made from unmodified solutions. Analysis by X-ray diffraction (XRD) revealed c-axis orientation factors for Bi4Ti3O12 near 88% and Bi3TiNbO9 near 63% in “modified” films. Atomic force microscopy images of films show microstructural improvement between “modified” and “unmodified” films. Images generally show smaller randomly oriented grains in “unmodified” films, and larger oriented platelet structures related to growth due to crystal habit in “modified” films. Light scattering experiments show the addition of photoresist to the precursor solution initiates accelerated particle growth. AFM imaging of soft-baked films also suggests an enhancement of texture. [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index
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