(Invited) ALD HfZrO2 Films from Ferroelectric to High-k Applications.
| Autor: | Leonhardt, Alessandra, Cimada, Jessica, Ramachandran, Ranjith, Surman, Matthew, John, Rohit, Mootheri, Vivek koladi, Tang, Fu, Schmotzer, Michael, Givens, Michael, Balseanu, Mihaela, Illiberi, Andrea |
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| Zdroj: | ECS Meeting Abstracts; 2024, Vol. MA2024 Issue 2, p2216-2216, 1p |
| Databáze: | Complementary Index |
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