| Autor: |
Wu, Yuyang, Zhang, Tianjiao, Guo, Deping, Li, Bicheng, Pei, Ke, You, Wenbin, Du, Yiqian, Xing, Wanchen, Lai, Yuxiang, Ji, Wei, Zhao, Yuda, Che, Renchao |
| Zdroj: |
Nature Communications; 12/2/2024, Vol. 15 Issue 1, p1-10, 10p |
| Abstrakt: |
The structure and dynamics of ferroelectric domain walls are essential for polarization switching in ferroelectrics, which remains relatively unexplored in two-dimensional ferroelectric α-In2Se3. Interlayer interactions engineering via selecting the stacking order in two-dimensional materials allows modulation of ferroelectric properties. Here, we report stacking-dependent ferroelectric domain walls in 2H and 3R stacked α-In2Se3, elucidating the resistance switching mechanism in ferroelectric semiconductor-metal junction devices. In 3R α-In2Se3, the in-plane movement of out-of-plane ferroelectric domain walls yield a large hysteresis window. Conversely, 2H α-In2Se3 devices favor in-plane domain walls and out-of-plane domain wall motion, producing a small hysteresis window. High electric fields induce a ferro-paraelectric phase transition of In2Se3, where 3R In2Se3 reaches the transition through intralayer atomic gliding, while 2H In2Se3 undergoes a complex process comprising intralayer bond dissociation and interlayer bond reconstruction. Our findings demonstrate tunable ferroelectric properties via stacking configurations, offering an expanded dimension for material engineering in ferroelectric devices. The lack of information on the ferroelectric domain walls motion characteristics in α-In2Se3 hampers the understanding of the ferroelectric semiconductor junction device mechanism. Here, the authors report that the stacking order of van der Waals α-In2Se3 determines its ferroelectric domain wall type and phase transition pathway. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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