Birefringence Induced by the Spatial Dispersion in Deep UV Lithography: Theory and Advanced Compensation Strategy.

Autor:	Serebriakov, Alexander, Maksimov, Evgenii, Bociort, Florian, Braat, Joseph
Předmět:	OPTICS LITHOGRAPHY PHOTONICS ULTRAVIOLET spectra DOUBLE refraction
Zdroj:	Optical Review; Mar/Apr2005, Vol. 12 Issue 2, p140-145, 6p, 2 Diagrams, 2 Charts
Abstrakt:	Birefringence induced by spatial dispersion (BISD), also called intrinsic birefringence, can cause a serious deterioration of the optical imaging quality of deep UV lithographic objectives at wavelengths below 193 nm. Recently the mathematical formalism for analyzing those aspects of the BISD effect that are relevant for optical design has been published. In this paper we give an equivalent but simplified derivation of these results. This mathematical formalism is then applied to optical system design and a compensation strategy is discussed. An example of an optical system is given where the phase retardation caused by the BISD effect has been corrected. [ABSTRACT FROM AUTHOR]
Databáze:	Complementary Index
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