| Abstrakt: |
This work presents Q-switched grown polycrystalline Nb2O5 thin films for the purpose of investigating the substrate temperature impact on the prepared films by pulsed laser deposition technique without any post-annealing treatment. The chosen range of the substrate temperature was from 250 to 650 °C with an increment scale of 100 °C. The influence of substrate temperature on the deposited films was tested by XRD analyses, photoluminescence analyses, UV–visible spectrophotometer, AFM, FE-SEM, and EDX analyses. These analytical measurements were for the purpose of studying the structural, optical, topographical, and morphological properties of the obtained films. The obtained thin films' thicknesses were increased with raising the substrate temperature and reported as 78.17, 84.14, 116.1, 128.3, and 172.7 nm, respectively. The XRD profile revealed that orthorhombic (T-Nb2O5) and monoclinic (H-Nb2O5) were formed. The average sizes of particles were 22.48, 46.13, 64.86, 109.1, and 93.76 nm for substrate temperatures of 250, 350, 450, 550 and 650 °C, respectively. The optical band gaps were shifted to lower values. The surface roughness was increased by increasing the substrate temperature. EDX analyses showed the existence of niobium and oxygen elements, and the obtained films were highly pure. [ABSTRACT FROM AUTHOR] |
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