| Autor: |
Naik, Asmita Sadanand, De Ataide, Ida De Noronha, Fernandes, Marina |
| Předmět: |
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| Zdroj: |
Journal of Conservative Dentistry & Endodontics; Aug2024, Vol. 27 Issue 8, p838-842, 5p |
| Abstrakt: |
Aim: The aim of this study was to evaluate the influence of 970 nm diode laser (DL) irradiation on the microtensile bond strength (μTBS) of etch-and-rinse adhesive (ERA) to dentin using phosphoric acid (PA) or alpha-hydroxy glycolic acid (GA) as etchants. Materials and Methods: A total of 32 human third molars were selected and assigned randomly among two different groups and four subgroups based on etching protocols and DL irradiation: PA, PA-DL, GA, and GA-DL. After tooth preparation and subsequent incremental composite build-up, the samples were stored in distilled water for 24 h at 37℃. μTBS values were obtained using the universal testing machine. The failure modes observed in dentin were categorized as adhesive, cohesive within dentin/resin, or mixed. Statistical Analysis: The data were analyzed using one-way analysis of variance, followed by Tukey's post hoc test (P = 0.001). Results: GA showed better or similar bond strength values to PA. Furthermore, irradiation of DL increased the μTBS to dentin when both PA or GA are used as etchants. Conclusion: GA can be used as an alternative etchant to PA. DL irradiation stands as a promising approach for elevating the performance of ERA adhesive systems to dentin. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
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