Enhanced quality of Al2O3/SiC gate stack via microwave plasma annealing.
| Autor: | You, Nan-Nan, Liu, Xin-Yu, Zhang, Qian, Wang, Zhen, Wang, Jia-Yi, Xu, Yang, Li, Xiu-Yan, Guo, Yu-Zheng, Wang, Sheng-Kai |
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| Zdroj: | Rare Metals; Oct2024, Vol. 43 Issue 10, p5362-5371, 10p |
| Databáze: | Complementary Index |
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