Novel halogenated cyclopentadienyl hafnium precursor for atomic layer deposition of high-performance HfO2 thin film.
Autor: | Park, Sangwook, Choi, Yoona, Park, Sunwoo, Lee, Hayoon, Lee, Kiho, Park, Jongwook, Jeon, Woojin |
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Zdroj: | RSC Advances; 2024, Vol. 14 Issue 39, p28791-28796, 6p |
Databáze: | Complementary Index |
Externí odkaz: |