Novel halogenated cyclopentadienyl hafnium precursor for atomic layer deposition of high-performance HfO2 thin film.

Autor: Park, Sangwook, Choi, Yoona, Park, Sunwoo, Lee, Hayoon, Lee, Kiho, Park, Jongwook, Jeon, Woojin
Zdroj: RSC Advances; 2024, Vol. 14 Issue 39, p28791-28796, 6p
Databáze: Complementary Index