Electron beam lithography of GeTe through polymorphic phase transformation.

Autor: Zhang, Hu, Li, Meng, Mi, Shao-Bo, Cheng, Shao-Dong, Lu, Lu, Chen, Zhi-Gang
Zdroj: Nanoscale Horizons; Sep2024, Vol. 9 Issue 9, p1574-1581, 8p
Databáze: Complementary Index