Understanding Ion Implantation Defect Distributions in Silicon Induced by FIB and Other Ion Sources Using Advanced STEM.
| Autor: | Jauregui, Luis J, Campbell, Deanna M, Titze, Michael, Scrymgeour, David, Lu, Ping |
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| Zdroj: | Microscopy & Microanalysis; 2024 Supplement, Vol. 30, p1-4, 4p |
| Databáze: | Complementary Index |
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