| Předmět: |
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| Zdroj: |
Health & Medicine Week; 71/9/2024, p8131-8131, 1p |
| Abstrakt: |
A patent application for a substrate cleaning apparatus and method has been filed by inventor Tomoatsu Ishibashi. The invention aims to address the increasing demand for higher accuracy in cleaning semiconductor devices during the substrate processing stage. The apparatus includes a cleaning member that contacts the substrate and a supply mechanism that provides an organic solvent for dissolution to remove foreign substances caused by the cleaning member. The invention offers a solution to suppress contamination and improve the reliability of semiconductor devices. [Extracted from the article] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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