Synthesis of micro-crosslinked adamantane-containing matrix resins designed for deep-UV lithography resists and their application in nanoimprint lithography.

Autor: Yang, Zi-Hao, Zhao, Jing, Cai, Ya-Juan, Yang, Xu, Zhao, Chuan-Zhe, Liu, Yang, Li, Yi-Bo, Sang, Ke-Xiao, Sun, Yi-Xing, Wu, Ya-Ge, Wei, Nan-Jun, Gai, Jing-Gang
Zdroj: Nanoscale; 6/28/2024, Vol. 16 Issue 24, p11651-11662, 12p
Databáze: Complementary Index