Synthesis of micro-crosslinked adamantane-containing matrix resins designed for deep-UV lithography resists and their application in nanoimprint lithography.
Autor: | Yang, Zi-Hao, Zhao, Jing, Cai, Ya-Juan, Yang, Xu, Zhao, Chuan-Zhe, Liu, Yang, Li, Yi-Bo, Sang, Ke-Xiao, Sun, Yi-Xing, Wu, Ya-Ge, Wei, Nan-Jun, Gai, Jing-Gang |
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Zdroj: | Nanoscale; 6/28/2024, Vol. 16 Issue 24, p11651-11662, 12p |
Databáze: | Complementary Index |
Externí odkaz: |