About the Data Analysis of Optical Emission Spectra of Reactive Ion Etching Processes—The Method of Spectral Redundancy Reduction.
| Autor: | Haase, Micha, Sayyed, Mudassir Ali, Langer, Jan, Reuter, Danny, Kuhn, Harald |
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| Zdroj: | Plasma; Mar2024, Vol. 7 Issue 1, p258-283, 26p |
| Databáze: | Complementary Index |
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