Conformal Electrodeposition of Mesoporous Silica over High Aspect Ratio (AR>100) Nanomesh Electrodes.
| Autor: | Rishikesan, Venkataramana, Vanheusden, Genis, Chanut, Nicolas, Ameloot, Rob, Vereecken, Philippe M. |
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| Zdroj: | ECS Meeting Abstracts; 2023, Vol. MA2023-02 Issue 1, p1282-1282, 1p |
| Databáze: | Complementary Index |
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