| Autor: |
Purwantoo, Setyo, Sujitno, Tjipto, Taryana, Yana, Putra, Teguh Yulius Surya Panca, Yuliani, Hanif, Rivai, Abu Khalid, Mardiyanto, Mardiyanto, Mustofa, Salim |
| Předmět: |
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| Zdroj: |
AIP Conference Proceedings; 2024, Vol. 2967 Issue 1, p1-8, 8p |
| Abstrakt: |
The surface modification of Kapton Polyimide (C22H10N2O5) film has been carried out with the Gadolinium (Gd) ion implantation technique at high doses and low energy. In this research, Kapton Polymide type HN film with a thickness of 125 micrometer was used. The ion doses used were 1×1015 ions/cm2 until 1×1017 ions/cm2 at energy ions 30 keV. This process is known to cause several changes in the properties of Kapton films, such as the degree of film crystallization, conductivity and magnetic properties and the microwave absorption properties of Kapton films. Simulation of the Gd ion implantation process with SRIM software showed that ions were embedded into the surface of the Kapton film as deep range between 20 until 50 nanometers. The distribution of Gd ions mapping in the subsurface region of the film was confirmed by SEM/EDX technique. As well as the distribution of constituent atoms of Kapton polyimide film such kind of Carbon, Hydrogen, Nitrogen and Oxygen with slighty change in composition due to carbonised polymer, degassing process as confirmed from X-ray diffraction pattern analysis. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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