Engineering of TiN (N = 1 – 15) nanoclusters by doping osmium impurity.

Autor: Moeti, Ramalebana, Phaahla, Tshegofatso M., Ngoepe, Phuti E., Chauke, Hasani R.
Zdroj: MATEC Web of Conferences; 12/15/2023, Vol. 388, p1-8, 8p
Databáze: Complementary Index