Engineering of TiN (N = 1 – 15) nanoclusters by doping osmium impurity.
Autor: | Moeti, Ramalebana, Phaahla, Tshegofatso M., Ngoepe, Phuti E., Chauke, Hasani R. |
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Zdroj: | MATEC Web of Conferences; 12/15/2023, Vol. 388, p1-8, 8p |
Databáze: | Complementary Index |
Externí odkaz: |