GMC: a negative acting resist used in the fabrication of chromium photomasks.
| Autor: | Novembre, A. E., Kowalski, L. M., Frackoviak, J., Mixon, D. A., Thompson, L. F. |
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| Zdroj: | Proceedings of SPIE; 2/18/2024, Vol. 12811, p1281108-1281108, 1p |
| Databáze: | Complementary Index |
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