Highly hydroxylated hafnium clusters are accessible to high resolution EUV photoresists under small energy doses.
| Autor: | Yu-Fang Tseng, Pin-Chia Liao, Po-Hsiung Chen, Tsai-Sheng Gau, Burn-Jeng Lin, Po-Wen Chiu, Jui-Hsiung Liu |
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| Zdroj: | Nanoscale Advances; 1/7/2024, Vol. 6 Issue 1, p197-208, 12p |
| Databáze: | Complementary Index |
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