Improvements on pattern fidelity at high curvature region of curvilinear mask with a novel method of MPC.
| Autor: | Kaneko, Ai, Fujii, Taigo, Ono, Itaru, Syukri, Ahmad, Torigoe, Yohei, Kim, Mincheol, Lee, Sukho, Kim, Eok Bong, Lee, Sanghee |
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| Zdroj: | Proceedings of SPIE; 12/20/2023, Vol. 12751, p127510U-127510U-9, 1p |
| Databáze: | Complementary Index |
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