EUV mask patterning process to enable opaque SRAFs for bright field EUV mask imaging.
| Autor: | Green, Michael, Halle, Scott, Ramadan, Mohamed, Lallement, Romain, Kamberian, Henry, Burkhardt, Martin, Beineke, Jinju, Rankin, Jed, Progler, Chris, McDermott, Steven |
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| Zdroj: | Proceedings of SPIE; 12/20/2023, Vol. 12751, p127510M-127510M-9, 1p |
| Databáze: | Complementary Index |
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