Displacement Talbot lithography process simulation analysis.
| Autor: | Dawes, Andrew M. C., Wang, Zhixin, Melvin, Lawrence S., Kuechler, Bernd, Demmerle, Wolfgang, Blais, Al, Wooley, Kelsey, Solak, Harun H. |
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| Zdroj: | Proceedings of SPIE; 12/20/2023, Vol. 12751, p127510C-127510C-8, 1p |
| Databáze: | Complementary Index |
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