Novel method for precise curved EUV mask CD characterization by adopting machine learning.
| Autor: | Lee, Jaeseo, Noh, Inhwan, Sung, Youngsu, Kim, Heebom, Kang, Ji-hoon, Kim, Seunghye, Choi, Jin |
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| Zdroj: | Proceedings of SPIE; 12/20/2023, Vol. 12751, p127510B-127510B-6, 1p |
| Databáze: | Complementary Index |
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