| Autor: |
Patil, Tanaji S., Kothavale, V. P., Malekar, V. P., Kamble, R. S., Patil, R. B., Gurav, K. V., Takale, M. V., Gangawane, S. A. |
| Předmět: |
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| Zdroj: |
Journal of Electronic Materials; Jan2024, Vol. 53 Issue 1, p394-407, 14p |
| Abstrakt: |
We report the effect of nickel (Ni) ion doping on the structure, morphology, and supercapacitive performance of Mn3O4 thin film electrodes, deposited by a simple electrophoretic deposition technique. The structural and compositional studies of these thin films were conducted by x-ray diffraction and Fourier transform infrared spectroscopy. The morphological and optical properties were investigated by scanning electron microscopy, transmission electron microscopy, and UV–visible spectroscopy. These studies confirmed the nanoflake-type surface morphology of nickel-doped thin films. X-ray photoelectron spectroscopy provided information about various valence states and surface composition of the thin films. Cyclic voltammetry study confirmed the surface redox pseudocapacitive behavior of all thin films. The 2 mol.% nickel ion-doped thin film electrode displayed the highest specific capacitance of 816 F g−1 and was evaluated from the galvanostatic charge/discharge curve. It also exhibited outstanding cyclic stability, with 93% capacitance retention after 2000 cycles. Electrochemical impedance spectroscopy revealed the improved supercapacitive performance of the nickel-doped Mn3O4 thin film electrodes, attributed to improved conductivity and charge transport for surface redox reactions. Thus, the present study suggests that the nickel-doped Mn3O4 thin film is a promising candidate as electrode material in supercapacitors. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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