Advancements in EUV photoresists for high-NA lithography.
| Autor: | Develioglu, Aysegul, Vockenhuber, Michaela, van Lent-Protasova, Lidia, Mochi, Iacopo, Ekinci, Yasin, Kazazis, Dimitrios |
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| Zdroj: | Proceedings of SPIE; 12/19/2023, Vol. 12750, p1275008-1275008, 1p |
| Databáze: | Complementary Index |
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