| Autor: |
Yavorskyi, R., Saliy, Ya., Nykyruy, L., Wisz, G., Adamiak, S., Cieniek, B., Naidych, B., Yavorskyi, Ya. |
| Předmět: |
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| Zdroj: |
Applied Nanoscience; Nov2023, Vol. 13 Issue 11, p7275-7287, 13p |
| Abstrakt: |
The technological parameters of obtaining and growth mechanisms of cadmium telluride thin films absorber layer deposited on glass and (100) silicon substrates by Physical vapor deposition method were studied. Compositions of thin films were studied by XRD on glass substrate obtained by different technological conditions. A major diffraction peak at 2θ = 23.69º of CdTe thin films on an amorphous glass substrate which corresponds to the (111) cubic orientation is observed. Diffraction peaks corresponding to compounds of Cd, Te and other metals were not detected. The surfaces of the films deposited on the glass substrate were studied by atomic force microscopy (AFM) in a periodic contact mode. The normal dimensions of a surface "scaly" shape are about 25–45 nm. A two-dimensional auto-correlation function was used to establish the symmetry and periodicity of the location of "scaly" nanoobjects on the film surface. Auto-correlation analysis was performed for sparse images to reduce the calculation time. To confirm the formation of parallel rows of nanoobjects on the surface of the films and to identify elements of symmetry, the images were analyzed using the Fourier transform method. Large cells of direct space calculated from cells in the central part of the Fourier space are close to hexagonal, but the lengths of the edges depend on the temperature of the evaporator for films on an amorphous glass substrate and the thickness of films deposited on silicon. The heights of large cells correlate with the distances between parallel rows calculated from auto-correlation images. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
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