Study on the photoelectric performance enhancement mechanism of Ti-Al co-doped Si films.

Autor: CHEN Yule, YANG Hongwang, LIN Yubei, KUANG Xiangjun, WEN Cai
Zdroj: Journal of Functional Materials / Gongneng Cailiao; 2023, Vol. 54 Issue 10, p10021-10029, 9p
Abstrakt: Ti-hyperdoped Si (Site) films are formed by doping of Si with a high concentration of Ti impurities, which is three orders of magnitude above the solid solubility limit, via a non-equilibrium effect of pulsed laser. The films get id of the Si bandgap limit and have an excellent subandgap NIR ( = 1 1002 500 nm) light ab¬sorption performance. In this paper, Ti-Al co-doped Si (Si:(Ti-Al)) ilms were prepared by vacuum electron contact angle reaches 110.5°, which increases 78.0° compared with the blank substrate. The Tazel polarization curves and the detailed polarization parameters indicates that the corrosion current density of the composite coating decreases by about two orders of magnitude compared with Hank substrate and the corrosion potential positively shifts from --1.029 V to 0.989 V after the coating deposition, proving that the silicone arch resin/ Cleo 2 composite coating can significantly reduce the corrosion rate of Q235 steel and improve Us corrosion resist¬ance. To verify the influence of the different kinds of silicone monomer on the deposition of composite coatings, ethenyitrimethoxy Shane (A171) and ethoxyvinyl illume (C6Hi4OSi) as silicone monomers were investigated, respectively. The water contact angle of the coating deposited in the solution containing A171 so 30.3° larger than that of the coating deposited in the solution containing C6 Hi4 Ossie. The corrosion current density of the compote coatings increases by about two orders of magnitude after the silicone monomer changing from A171 to C6Hi4OSi, which may be caused by the longer molecular chain and the Wager spatial steric effect of C6Hi4 Ossie, making it more difficult to polymerize and depot. So A171 Is more Suita Me as silicone monomer in our re¬search system. [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index